Microfabrication processes for CMOS, bipolar, MEMS, and microfluidics devices. Laboratory safety. Deposition processes of oxidation, evaporation and sputtering. Lithography, wet and dry etch, and device characterization. Note: Consent of Department required. Credit may be obtained in only one of ECE 457 or E E 457.
Section | Capacity | Class times | Instructor(s) |
---|---|---|---|
LECTURE A1
(51673) |
28 |
2024-09-03 - 2024-12-09 (TR)
08:00 - 09:20
NRE 2-016
|
|
Section | Capacity | Class times | Instructor(s) |
---|---|---|---|
LAB D11
(49802) |
4 |
2024-09-03 - 2024-12-09 (M)
14:00 - 15:50
ECERF W1-060
|
|
LAB D21
(46820) |
4 |
2024-09-03 - 2024-12-09 (T)
14:00 - 15:50
ECERF W1-060
|
|
LAB D22
(53067) |
4 |
2024-09-03 - 2024-12-09 (T)
16:00 - 17:50
ECERF W1-060
|
|
LAB D31
(46785) |
4 |
2024-09-03 - 2024-12-09 (W)
14:00 - 15:50
ECERF W1-060
|
|
LAB D32
(53068) |
4 |
2024-09-03 - 2024-12-09 (W)
16:00 - 17:50
ECERF W1-060
|
|
LAB D41
(49838) |
4 |
2024-09-03 - 2024-12-09 (R)
14:00 - 15:50
ECERF W1-060
|
|
LAB D51
(46784) |
4 |
2024-09-03 - 2024-12-09 (F)
14:00 - 15:50
ECERF W1-060
|
|
Section | Capacity | Class times | Instructor(s) |
---|---|---|---|
LECTURE B1
(70508) |
20 |
2025-01-06 - 2025-04-09 (MWF)
09:00 - 09:50
TBD
|
|
Section | Capacity | Class times | Instructor(s) |
---|---|---|---|
LAB H11
(77500) |
4 |
2025-01-06 - 2025-04-09 (M)
14:00 - 15:50
ECERF W1-060
|
|
LAB H21
(77156) |
4 |
2025-01-06 - 2025-04-09 (T)
14:00 - 15:50
ECERF W1-060
|
|
LAB H31
(72132) |
4 |
2025-01-06 - 2025-04-09 (W)
14:00 - 15:50
ECERF W1-060
|
|
LAB H41
(72133) |
4 |
2025-01-06 - 2025-04-09 (R)
14:00 - 15:50
ECERF W1-060
|
|
LAB H51
(77157) |
4 |
2025-01-06 - 2025-04-09 (F)
14:00 - 15:50
ECERF W1-060
|
|